Holiday
GEN III綜三LRA R2R3R4
Tokyo Electron Technology Introduction We would like to give an introduction to semiconductor fabrication technologies and what role Tokyo Electron takes in this Industry. In particular, we will explain some basics of Tokyo Electron’s equipment processing technology including oxidation (reviewing various thermal processes), deposition (Chemical Vapor Deposition, Atomic la<x>yer Deposition and Physical Vapor Deposition), dry removal (Plasma etching and Gas Etching), wet cleaning and removal (batch and single wafer, and advanced drying technologies), coater-developer and advanced packaging related technologies. Additionally, we will discuss TEL’s approach to leveraging strengths, aggressive R&D investment, TEL’s focus on the environment and people.
MON | TUE | WED | THU | FRI | |
08:00108:50 | |||||
09:00209:50 | |||||
10:10311:00 | |||||
11:10412:00 | |||||
12:10n13:00 | |||||
13:20514:10 | |||||
14:20615:10 | |||||
15:30716:20 | |||||
16:30817:20 | |||||
17:30918:20 | |||||
18:30a19:20 | |||||
19:30b20:20 | |||||
20:30c21:20 |
Average GPA 4.22
Std. Deviation 0.25
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