Holiday
GEN III綜三LRB T3T4
本課程將教授光學鄰近效應修正之簡介、架構、理論及實際應用。光學鄰近效應修正(Optical Proximity Correction, OPC),為先進半導體製程之不可或缺技術,尤其半導體技術進入奈米級節點後,沒有經過OPC修正之光罩根本無法使用。OPC技 技術牽扯到複雜的光學、物理、化學、電漿物理、及材料力學,本課程將以深入淺出之方式,帶領學生理解,甚至進入專業領 域。課程將以課堂教授之方式進行,視客觀條件進行軟體實際操作及教學。
Course keywords: 微影技術,光學鄰近效應修正,光罩,半導體,曝光機,光阻 指定用書 列印講義 參考書籍 Optical Lithography : Here is why, Burn J. Lin Fundamental Principles of Optical Lithography, Chris Mack Introduction to Fourier Optics J.W. Goodman 教學方式 以課堂直接教授方式,視實際狀況許可進行OPC軟體教學及操作 教學進度 Introduction 1.5 week OPC history 0.5 week OPC model 3 weeks Rule & correction 1 weeks Model & Rule Characterization 1 weeks Verification 2 weeks Pattern decomposition 2 weeks Assist feature & inverse lithography 2 weeks OPC and process 3 weeks Plus 1 week mid term and 1 week final examination, total 18 weeks 成績考核 期中考 40% 期末考 50% 作業 10%
MON | TUE | WED | THU | FRI | |
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12:10n13:00 | |||||
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15:30716:20 | |||||
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18:30a19:20 | |||||
19:30b20:20 | |||||
20:30c21:20 |
Average Percentage 91.82
Std. Deviation 7.71
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